Autumn Semester 2020 takes place in a mixed form of online and classroom teaching.
Please read the published information on the individual courses carefully.

Christof Schneider: Catalogue data in Spring Semester 2015

Name PD Dr. Christof Schneider
Paul Scherrer Institut (PSI)
5232 Villigen PSI
Telephone056 310 41 22

327-2104-00LInorganic Thin Films: Processing, Properties and Applications2 credits2GT. Lippert, C. Schneider
AbstractIntroduction to thin films growth and properties. The nucleation and growth of thin film theory is presented and the obtainable microstructures are illustrated. Main processing and characterization techniques will be discussed.
ObjectiveAchieve an understanding of major film growth methods, the most important growth mechanisms and characterization techniques.
To obtain a basic knowledge of specific thin film properties and selected applications.
ContentThis course gives an introduction to the topic of thin films growth with an emphasis on oxides, respectively oxide thin films. The main deposition techniques available for oxide thin film growth are physical and chemical vapor deposition techniques (PVD and CVD) as well as so called “wet techniques” (e.g. spin coating and spray pyrolysis). A special emphasis will be given to techniques which are important for industrial applications and basic research. A part of the course discusses vacuum technologies, materials selection and preparation.
The second main topic is thin film characterization which includes structural, chemical, mechanical, magnetic and electrical properties as well as the quantitative analysis of thin film composition. Finally, microfabrication and packaging are a topic of great technological importance and the basis for industrial applications.

I Table of Content

1 Introduction

2 Thin Film Fundamentals
2.1 Thin Film Formation
2.2 Thin Film Microstructure
2.3 Grain Growth
2.4 Epitaxy and Texture

3 Deposition Techniques
3.1 Vacuum Deposition Techniques
3.1.1 Evaporation and Molecular Beam Epitaxy (MBE)
3.1.2 Sputtering
3.1.3 Pulsed Laser Deposition (PLD)
3.1.4 Chemical Vapor Deposition
3.2 Non-Vacuum Deposition Techniques
3.2.1 Spray Pyrolysis
3.2.2 Sol Gel Deposition
3.2.3 Electroplating and Electrophoresis

4 Properties and Characterization
4.1 Surface and Mechanical Properties
4.2 Thermal Properties
4.3 Structural Properties
4.4 Compositional Analysis
4.5 Chemical Properties
4.6 Electrical and Magnetic Properties
4.7 Optical Properties

5 Industrial Applications
Lecture notesLecture notes will be provided.
LiteratureM. Ohring, “Materials science of thin films”, Academic Press
A. Elshabini-Riad, F.D. Barlow, “Thin film technology handbook”, Mc Graw Hill