327-2104-00L Inorganic Thin Films: Processing, Properties and Applications
Semester | Spring Semester 2014 |
Lecturers | T. Lippert, C. Schneider |
Periodicity | yearly recurring course |
Language of instruction | English |
Courses
Number | Title | Hours | Lecturers | ||||
---|---|---|---|---|---|---|---|
327-2104-00 V | Inorganic Thin Films: Processing, Properties and Applications | 2 hrs |
| T. Lippert, C. Schneider | |||
327-2104-00 U | Inorganic Thin Films: Processing, Properties and Applications | 2 hrs |
| T. Lippert |
Catalogue data
Abstract | Introduction to thin films growth and properties. The nucleation and growth of thin film theory is presented and the obtainable microstructures are illustrated. Main processing and characterization techniques will be discussed. |
Objective | Achieve an understanding of major film growth methods, the most important growth mechanisms and characterization techniques. To obtain a basic knowledge of specific thin film properties and selected applications. |
Content | This course gives an introduction to the topic of thin films growth with an emphasis on oxides, respectively oxide thin films. The main deposition techniques available for oxide thin film growth are physical and chemical vapor deposition techniques (PVD and CVD) as well as so called “wet techniques” (e.g. spin coating and spray pyrolysis). A special emphasis will be given to techniques which are important for industrial applications and basic research. A part of the course discusses vacuum technologies, materials selection and preparation. The second main topic is thin film characterization which includes structural, chemical, mechanical, magnetic and electrical properties as well as the quantitative analysis of thin film composition. Finally, microfabrication and packaging are a topic of great technological importance and the basis for industrial applications. I Table of Content 1 Introduction 2 Thin Film Fundamentals 2.1 Thin Film Formation 2.2 Thin Film Microstructure 2.3 Grain Growth 2.4 Epitaxy and Texture 3 Deposition Techniques 3.1 Vacuum Deposition Techniques 3.1.1 Evaporation and Molecular Beam Epitaxy (MBE) 3.1.2 Sputtering 3.1.3 Pulsed Laser Deposition (PLD) 3.1.4 Chemical Vapor Deposition 3.2 Non-Vacuum Deposition Techniques 3.2.1 Spray Pyrolysis 3.2.2 Sol Gel Deposition 3.2.3 Electroplating and Electrophoresis 4 Properties and Characterization 4.1 Surface and Mechanical Properties 4.2 Thermal Properties 4.3 Structural Properties 4.4 Compositional Analysis 4.5 Chemical Properties 4.6 Electrical and Magnetic Properties 4.7 Optical Properties 5 Industrial Applications |
Lecture notes | Lecture notes will be provided. |
Literature | M. Ohring, “Materials science of thin films”, Academic Press A. Elshabini-Riad, F.D. Barlow, “Thin film technology handbook”, Mc Graw Hill |
Performance assessment
Performance assessment information (valid until the course unit is held again) | |
Performance assessment as a semester course | |
ECTS credits | 2 credits |
Examiners | T. Lippert, C. Schneider |
Type | end-of-semester examination |
Language of examination | English |
Repetition | A repetition date will be offered in the first two weeks of the semester immediately consecutive. |
Additional information on mode of examination | Written exam 1 week after last lecture, 90 min., no written aids. |
Learning materials
No public learning materials available. | |
Only public learning materials are listed. |
Groups
No information on groups available. |
Restrictions
There are no additional restrictions for the registration. |
Offered in
Programme | Section | Type | |
---|---|---|---|
Materials Science Master | Materials Creation | W | |
Materials Science Master | Elective Courses | W |