Werner Wegscheider: Catalogue data in Spring Semester 2019 |
Name | Prof. Dr. Werner Wegscheider |
Field | Sold State Physics |
Address | Laboratorium für Festkörperphysik ETH Zürich, HPF E 7 Otto-Stern-Weg 1 8093 Zürich SWITZERLAND |
Telephone | +41 44 633 77 40 |
werner.wegscheider@phys.ethz.ch | |
URL | https://mbe.ethz.ch |
Department | Physics |
Relationship | Full Professor |
Number | Title | ECTS | Hours | Lecturers | |
---|---|---|---|---|---|
402-0034-10L | Physics II | 4 credits | 2V + 2U | W. Wegscheider | |
Abstract | This is a two-semester course introducing students into the foundations of Modern Physics. Topics include electricity and magnetism, light, waves, quantum physics, solid state physics, and semiconductors. Selected topics with important applications in industry will also be considered. | ||||
Learning objective | The lecture is intended to promote critical, scientific thinking. Key concepts of Physics will be acquired, with a focus on technically relevant applications. At the end of the two semesters, students will have a good overview over the topics of classical and modern Physics. | ||||
Content | Introduction into Quantum Physics, Absorption and Emission of Electromagnetic Radiation, Basics of Solid State Physics, Semiconductors | ||||
Lecture notes | Lecture notes will be available in German. | ||||
Literature | Paul A. Tipler, Gene Mosca, Michael Basler und Renate Dohmen Physik: für Wissenschaftler und Ingenieure Spektrum Akademischer Verlag, 2009, 1636 Seiten, ca. 80 Euro. Paul A. Tipler, Ralph A. Llewellyn Moderne Physik Oldenbourg Wissenschaftsverlag, 2009, 982 Seiten, ca. 75 Euro. | ||||
Prerequisites / Notice | No testat requirements for this lecture. | ||||
402-0318-00L | Semiconductor Materials: Characterization, Processing and Devices | 6 credits | 2V + 1U | S. Schön, W. Wegscheider | |
Abstract | This course gives an introduction into the fundamentals of semiconductor materials. The main focus in this semester is on state-of-the-art characterization, semiconductor processing and devices. | ||||
Learning objective | Basic knowledge of semiconductor physics and technology. Application of this knowledge for state-of-the-art semiconductor device processing | ||||
Content | 1. Material characterization: structural and chemical methods 1.1 X-ray diffraction methods (Powder diffraction, HRXRD, XRR, RSM) 1.2 Electron microscopy Methods (SEM, EDX, TEM, STEM, EELS) 1.3 SIMS, RBS 2. Material characterization: electronic methods 2.1 van der Pauw techniquel2.2 Floating zone method 2.2 Hall effect 2.3 Cyclotron resonance spectroscopy 2.4. Quantum Hall effect 3. Material characterization: Optical methods 3.1 Absorption methods 3.2 Photoluminescence methods 3.3 FTIR, Raman spectroscopy 4. Semiconductor processing: lithography 4.1 Optical lithography methods 4.2 Electron beam lithography 4.3 FIB lithography 4.4 Scanning probe lithography 4.5 Direct growth methods (CEO, Nanowires) 5. Semiconductor processing: structuring of layers and devices 5.1 Wet etching methods 5.2 Dry etching methods (RIE, ICP, ion milling) 5.3 Physical vapor depositon methods (thermal, e-beam, sputtering) 5.4 Chemical vapor Deposition methods (PECVD, LPCVD, ALD) 5.5 Cleanroom basics & tour 6. Semiconductor devices 6.1 Semiconductor lasers 6.2 LED & detectors 6.3 Solar cells 6.4 Transistors (FET, HBT, HEMT) | ||||
Lecture notes | https://moodle-app2.let.ethz.ch/course/view.php?id=10464 | ||||
Prerequisites / Notice | The "compulsory performance element" of this lecture is a short presentation of a research paper complementing the lecture topics. Several topics and corresponding papers will be offered on the moodle page of this lecture. |