Christof Schneider: Catalogue data in Autumn Semester 2024 |
| Name | PD Dr. Christof Schneider |
| Field | Experimentalphysik |
| Address | Paul Scherrer Institut (PSI) OFLB/U111 5232 Villigen PSI SWITZERLAND |
| Telephone | 056 310 41 22 |
| schristo@ethz.ch | |
| URL | https://www.psi.ch/en/lmx-interfaces/people/christof-schneider |
| Department | Physics |
| Relationship | Privatdozent |
| Number | Title | ECTS | Hours | Lecturers | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
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| 327-2210-00L | Thin Films Technology - From Fundamentals to Oxide Electronics Students who already took "327-2104-00L Inorganic Thin Films: Processing, Properties and Applications" AND "327-2132-00 Multifunctional Ferroic Materials: Growth and Characterisation" are not allowed to attend this course. | 5 credits | 4G | M. Trassin, C. Schneider | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| Abstract | Oxide films with a thickness of just a few atoms can now be grown with a precision matching that of semiconductors. This opens up a whole world of functional device concepts and fascinating phenomena that would not occur in the expanded bulk crystal. We will give an introduction to thin films deposition techniques and applications with a focus on the growth of multifunctional oxide thin films. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| Learning objective | In this course students will obtain an overarching view on thin film deposition techniques with a focus on epitaxial deposition processes. The main learning objectives are: - Identification of most relevant deposition technique for a given application. - Understanding of growth mechanism and growth modes. - Understanding strategies for engineering the functionalities of the films using the deposition process. - Selection of the most appropriate characterization technique. - Understanding device concepts and fundamental limits in the technology relevant ultra-thin limit. - Assessing the relevance of scientific literature dealing with complex oxide thin films. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| Content | A lab visit visit will be organized and students will participate to the design of thin films with atomic precision. General description of the leading deposition routes including physical and chemical vapor deposition techniques (PVD and CVD) as well as so called "wet techniques" (e.g. spin coating and spray pyrolysis). Growth modes and processes. Part of the course discusses vacuum technologies. Fundamental characterization techniques for application-relevant thin films as well as state of the art approaches for in situ and ex-situ determination of the structural, chemical and ferroic (ferromagnetic and ferroelectric) properties of films: (XRD for thin films, RHEED, EDX, scanning probe microscopy techniques, laser-optical characterization and many more) Epitaxy for the advanced design and characterization of high quality thin films for energy efficient oxide electronics. Types of ferroic order, multiferroics, mulitfiunctional oxide materials, epitaxial strain related effects, oxide thin film based devices and examples. Regular discussions on preselected scientific literature and mini-seminars will be organized. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
Competencies |
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