402-0317-00L Semiconductor Materials: Fundamentals and Fabrication
Semester | Autumn Semester 2018 |
Lecturers | S. Schön, W. Wegscheider |
Periodicity | yearly recurring course |
Language of instruction | English |
Abstract | This course gives an introduction into the fundamentals of semiconductor materials. The main focus is on state-of-the-art fabrication and characterization methods. The course will be continued in the spring term with a focus on applications. |
Learning objective | Basic knowledge of semiconductor physics and technology. Application of this knowledge for state-of-the-art semiconductor device processing |
Content | 1. Fundamentals of Solid State Physics 1.1 Semiconductor materials 1.2 Band structures 1.3 Carrier statistics in intrinsic and doped semiconductors 1.4 p-n junctions 1.5 Low-dimensional structures 2. Bulk Material growth of Semiconductors 2.1 Czochalski method 2.2 Floating zone method 2.3 High pressure synthesis 3. Semiconductor Epitaxy 3.1 Fundamentals of Epitaxy 3.2 Molecular Beam Epitaxy (MBE) 3.3 Metal-Organic Chemical Vapor Deposition (MOCVD) 3.4 Liquid Phase Epitaxy (LPE) 4. In situ characterization 4.1 Pressure and temperature 4.2 Reflectometry 4.3 Ellipsometry and RAS 4.4 LEED, AES, XPS 4.5 STM, AFM 5. The invention of the transistor - Christmas lecture |
Lecture notes | https://moodle-app2.let.ethz.ch/course/view.php?id=4865 |
Prerequisites / Notice | The "compulsory performance element" of this lecture is a short presentation of a research paper complementing the lecture topics. Several topics and corresponding papers will be offered on the moodle page of this lecture. |